Spectrometric Film Thickness Measurement System Lambda Ace VM-2200 / VM-3200 Series

Meets a Variety of Needs with a Compact Design
Lambda Ace VM-2200 / VM-3200 Series

VM-2200 Series


  1. The VM-2200 series offers high throughput of up to 150 wafers per hour in high-speed mode (during five-point measurement of SiO2 wafers).
  2. The VM-2200 series features a space-saving, compact design that makes it easy to fit the units into existing space, and makes production line layout much easier.
    Dimensions: 965 mm (W) x 785 mm (D) x 1695 mm (H)
  3. The VM-2200 series features a log function that supports improved maintenance. Screen has also taken advantage of its years of experience in the semiconductor industry to create a design that makes maintenance easy. The units were developed and are manufactured entirely within Japan, and parts can be shipped quickly from Japan to other parts of the world.
  4. Recipes are easy to create, and entering optical constants is simple, thanks to Screen's experience in the field. The software can be controlled almost entirely using the mouse, and pen touch panel operation is also supported. The stage is controlled using a joystick.

VM-3200 Series


  1. Measurements are backed by an excellent repeatability of 3ρE0.3nm (SiO2 on Si, using a 10X objective lens for measurement of 1 µm).
  2. In addition to the standard 25 types of film, the UV model* can also measure an ultra thin film and a film on SOI or poly-Si wafers.
  3. Two types of auto-focus, laser and contrast, are standard. This enables the use of auto-focus regardless of the film thickness and type.
  4. Measurement of 1 µm diameter spots is supported (with a 50X objective lens*). What’s more, image alignment* enables automatic mapping of patterned wafers.
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